Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
With the CMOS transistors being scaled to sub 45nm and lower, Negative Bias Temperature Instability (NBTI) has become a major concern due to its impact on PMOS transistor aging pr...
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
— Post-silicon debug comprises a significant and highly variable fraction of the total development time for large chip designs. To accelerate post-silicon debug, BackSpace [1, 2...
Johnny J. W. Kuan, Steven J. E. Wilton, Tor M. Aam...
— Algorithms and tools used for IC implementation do not show deterministic and predictable behaviors with input parameter changes. Due to suboptimality and inaccuracy of underly...
— Timing exceptions in IC implementation processes, especially timing verification, help reduce pessimism that arises from unnecessary timing constraints by masking non-function...
Abstract— As the semiconductor technology continues its marching toward the deep sub-micron domain, the strong relation between leakage current and temperature becomes critical i...
—Negative Bias Temperature Instability (NBTI) is one of the major reliability problems in advanced technologies. NBTI causes threshold voltage degradation in a PMOS transistor wh...
Leakage power has grown significantly and is a major challenge in SoC design. Among SoC's components, clock distribution network power accounts for a large portion of chip po...
Houman Homayoun, Shahin Golshan, Eli Bozorgzadeh, ...